Results by applying our core technologies (Single Wavelength Interferometry and White Light Reflectance Spectroscopy) have been obtain by our group in a wide range of diverse applications such as: Photoresist dissolution, Polymer thermal analysis, Film treatment under various chemical environments, Biosensors, Chemical Sesnors.

Such typical publications are shown in the list below. For a copy of any of these articles please send an e-mail to This email address is being protected from spambots. You need JavaScript enabled to view it.


Publications in International Journals

1. I.Raptis, D.Velesiotis, M.Vasilopoulou, P.Argitis Microelectron. Eng. 53 489(2000) “Development mechanism study by dissolution monitoring of positive methacrylate resists”
2. N.Glezos, P.Argitis, D.Velessiotis, I.Raptis, M.Hatzakis, P.Hudek, I.Kostic J. Vac. Sci. Technol B18 3431(2000) “Aqueous base development and acid diffusion length optimisation in negative epoxy resist for electron beam lithography”
3. I.Raptis Microelectron. Eng. 57-58 525(2001) “Free volume effects in resist lithographic performance”
4. D.F.Stamatialis, M.Sanopoulou, I.Raptis J. Appl. Polym. Sci. 83 2823(2002) “Swelling and dissolution behavior of poly(methyl methacrylate) films in methyl ethyl ketone/methyl alcohol mixtures studied by optical techniques”
5. I.Raptis, C.D.Diakoumakos Microelectron. Eng. 61-62 829(2002) “Non destructive method for monitoring glass transitions in thin photoresist films”
6. M.Chatzichristidi, I.Raptis, C.D.Diakoumakos, N.Glezos, P.Argitis, M.Sanopoulou Microelectron. Eng. 61-62 729(2002) “Strippable aqueous base developable negative photoresist for high aspect ratio micromachining”
7. M.Chatzichristidi, I.Raptis, P.Argitis J. Everett J. Vac. Sci. Technol. B20 2968(2002) “Partially hydrogenated poly(vinyl phenol) based photoresist for near UV, high aspect ratio micromachining”
8. C.D.Diakoumakos, I.Raptis Polymer 44 251(2003) “In-situ monitoring of thermal transitions in thin polymeric films via optical Interferometry”
9. I.Raptis, D.Niakoula, V.Bellas, E.Tegou, E.Gogolides, P.Argitis, K.G.Papadokostaki, A.Ioannidis Microelectron. Eng. 67-68 283(2003) “Resist process issues related to the glass transition changes in thin conventional and chemically amplified resist films”
10. A.Olzierski, I.Raptis Microelectron. Eng. 73–74 244(2004) “Development and molecular weight issues on the lithographic performance of poly(methylmethacrylate)”
11. D.Niakoula, I.Raptis, D.Goustouridis, P.Argitis Jpn. J. Appl. Phys. 43 5247(2004) “Glass transition temperature monitoring in bilayer and patterned photoresist films“
12. S.Chatzandroulis, D.Goustouridis, I.Raptis Microelectron. Eng. 78-79 118(2005) “Polymeric film characterization for use in bimorph chemical sensors”
13. D.Goustouridis, K.Manoli, S.Chatzandroulis, M.Sanopoulou, I.Raptis Sens. Act. B 111-112, 549(2005) ”Characterization of Polymer Layers for Silicon Micromachined Bilayer Chemical
14. J.Raczkowska, A.Bernasik, A.Budkowski, P.Cyganik, J.Rysz, I.Raptis, P.Czuba Surf. Sci. 600 1004(2006) “Pattern guided structure formation in polymer films of asymmetric blends”
15. S.Marceau, J.-H.Tortai, J.Tillier, N.Vourdas, E.Gogolides, I.Raptis, K.Beltsios, K.van Werden Microelectron. Eng. 83 1073(2006) “Thickness-dependent glass transition temperature of thin resist films for high resolution lithography”
16. K.Manoli, D.Goustouridis, S.Chatzandroulis, I.Raptis, E.S.Valamontes, M.Sanopoulou, Polymer 47 6117(2006) “Vapor sorption in thin supported polymer films studied by white light interferometry”
17. N.Vourdas, G.Karadimos, D.Goustouridis, E.Gogolides, A.G.Boudouvis, J.-H.Tortai, K.Beltsios, I.Raptis J. Appl. Polym. Sci. 102 4764(2006) “Multi-wavelength interferometry and competing optical methods for the thermal probing of thin polymeric films”
18. J.Jaczewska, A.Budkowski, A.Bernasik, I.Raptis, J.Raczkowska, D.Goustouridis, J.Rysz, M.Sanopoulou J. Appl. Polym. Sci. 105 67(2007) “Humidity effects in spin-coated films of polythiophene-polystyrene blends”
19. I.Raptis, J.Kovač, M.Chatzichristidi, E.Sarantopoulou, Z.Kollia, S.Kobe, A.C.Cefalas J. Laser Micro/Nanoengineering 2 200(2007) “Enhancement of sensing properties of thin poly(methyl methacrylate) films by VUV surface modification”
20. M.Kitsara, K.Beltsios, D.Goustouridis, S.Chatzandroulis, I.Raptis Eur. Polymer J. 43 4602(2007) “Sequential polymer lithography for chemical sensor arrays”
21. J.Jaczewska, I.Raptis, A.Budkowski, D.Goustouridis, J.Raczkowska, M.Sanopoulou, E.Pamuła, A. Bernasik, J.Rysz Synth. Met. 157 726(2007) “Swelling of poly(3-alkylthiophene) films exposed to solvent vapours and humidity: Evaluation of solubility parameters”
22. A.Kokkinis, E.S.Valamontes, D.Goustouridis, Th.Ganetsos, K.Beltsios, I.Raptis Microelectron. Eng. 85 93(2008) “Molecular weight and processing effects on the dissolution properties of thin poly(methyl methacrylate) films”
23. D.Drygiannakis, G.P.Patsis, K.vanWerden, A.Boudouvis, I.Raptis Microelectron. Eng. 85 955(2008) “Processing effects on the dissolution properties of thin chemically amplified photoresist films”
24. E.Sarantopoulou, Z.Kollia, A.C.Cefalas, K.Manoli, M.Sanopoulou, D.Goustouridis, S.Chatzandroulis, I.Raptis Appl. Surf. Sci. 254 1710(2008) “Surface nano/micro functionalization of PMMA thin films by 157 nm irradiation for sensing applications”
25. P.S.Petrou, D.Ricklin, M.Zavali, I.Raptis, S.E.Kakabakos, K.Misiakos, J.D.Lambris Biosens. Bioelectron. 24 3359(2009) “Real-time label-free detection of complement activation products in human serum by white light reflectance spectroscopy”
26. K.Manoli, D.Goustouridis, I.Raptis, E.Valamontes, M.Sanopoulou J. Appl. Polym. Sci. 116 184(2010) “Vapor-induced swelling of supported methacrylic and siloxane polymer films: determination of interaction parameters”
27. D.Goustouridis, I.Raptis, E.Valamontes, M.Chatzichrisitidi Microelectron. Eng. 87 1115(2010) “Integrated tool for the spreading, thermal treatment and in-situ process monitoring of thick photoresist films”