FR-ES is a compact and light-weighted unit for the non-destructive characterization of transparent and semi-transparent coatings in a wide thickness range and of thin metallic layers. FR-ES is the ideal configuration for research labs. With FR-ES, the user can perform reflectance reflectance and transmittance measurements in various spectral ranges.
FR-ES platform is designed to provide excellent performance in terms of characterization of coatings at a small footprint. It is employed in a wide range of diverse measurement applications: Film thickness, Refractive Index, Color, Transmittance, Reflectance, and many more. There are five FR-ES configurations available:
UV/VIS (200-850nm),
UV/NIR-EXT (200-1000nm),
UV/NIR-HR (190-1100nm)
NIR-N1 (850-1050nm),
NIR (900-1700nm)
Then, there is a wide range of Accessories, such as:
▪ Filters to block light at certain spectral regimes
▪ FR-Mic for measurements at very small areas,
▪ Manual stage, 25x25mm, 100x100mm or 200x200mm
▪ Film/Cuvette Holder for Absorbance / Transmittance and chemical concentration measurements,
▪ Integration Spheres for diffuse & total reflectance
- Univ. & Research labs
- Semiconductors
- Polymer & Resist characterization
- Chemical measurements
- Dialectric characterizations
- Biomedical
- Hardcoat Anodization, Metal parts process
- Optical Coating
- non-metal Films
- And many more
(contact us with your requirements)
- Single-click analysis (no need for initial guess)
- Dynamic measurements
- Measurement of n & k, color
- Multiple installations for off-line analysis
| Model | VIS/NIR | NIR | NIR-N1 | D VIS/NIR | UV/VIS | UV/NIR-EXT | UV/NIR-HR |
|---|---|---|---|---|---|---|---|
| WL Range-nm | 380-1020 | 900-1700 | 850-1050 | 380-1700 | 200-850 | 200-1000 | 190-1100 |
| Pixels | 3648 | 512 | 3648 | 3748 & 512 | 3648 | 3648 | 2048 |
| Min Thick -SiO₂ | 12nm | 50nm | 1μm | 12nm | 1nm | 1nm | 1nm |
| Max Thick SiO₂ | 120μm | 250μm | 500μm | 250μm | 80μm | 90μm | 100μm |
| n&k -Min. Thickness | 100nm | 500nm | 100nm | 50nm | 50nm | 50nm | |
| Thick. Accuracy *,** | 2nm /0.2% | 3nm /0.4% | 50nm /0.2% | 2nm /0.2% | 1nm /0.2% | 1nm /0.2% | 1nm /0.2% |
| Thick. Precision *,** | 0.05nm | 0.1nm | 0.1nm | 0.05nm | 0.05nm | ||
| Thick. stability *,** | 0.05nm | 0.15nm | 0.15nm | 0.05nm | 0.05nm | ||
| API support | YES | ||||||
| Light Source | Halogen (internal), 3000h (MTBF) | VIS/NIR operation: Halogen (internal), 3000h (MTBF) UV/NIR operation: LS-2, Deuterium -Halogen, 2000h (MTBF) |
|||||
| Integration Time | 5msec (min) | 5msec (min) | 5msec (min) | 5msec (min) | 5msec (min) | 5msec (min) | |
| Spot size | Diameter of ~350-400μm (smaller spot size as option) | ||||||
| Material Database | > 800 different materials | ||||||
| Dimensions/Weight Power | FR-ES: 20x22x6cm (LxWxH), 1.8Kg (stage excluded), FR-ES D: 20x27x12cm (LxWxH), 3.3Kg (stage excluded) 110V/230V, 50-60Hz, 20-50W (LS-2, external light source is excluded) | ||||||
| SW Characterristics | FR-Monitor v4.0 (free of charge updates) Full S/W details are listed at the related catalog’s page | ||||||
Focusing module: Optical module attached on the reflection probe for <100μm diameter spot size
Transmittance module: Optical module for transmittance/absorbance measurements
Film/Cuvette kit: Transmission measurements of films or liquids in standard cuvettes
Contact probe: Thickness & optical measurements of coatings in the field. Ideal for curved surfaces
Microscope: Microscope-based reflectance and thickness measurements with high lateral resolution
Manual X-Y stage: Manual X-Y stage for measurements over an area of 25x25mm /100x100mm / 200x200mm