Article “In-situ characterization of the development step of high-resolution e-beam resists”

The optimization of the development conditions in a lithography process is crucial for the overall lithographic performance while the study of the development step provides useful information regarding the properties of the lithographic material. In this work, high resolution e-beam resists are studied through in-situ monitoring of resist thickness evolution during the development step. In-situ monitoring of the resist thickness is conducted through fitting of the spectroscopic reflectance of resist films coated on dielectric layers on Si wafers and by using light at wavelengths that do not modify the lithographic properties of the resist film. The methodology was applied in the case of two selected commercially available high resolution e-beam resists and the dissolution process was monitored in depth. The recorded results prove that in-situ dissolution monitoring is a powerful tool for the generation of experimentally based development models for the lithographic materials employed in high resolution lithography. These dissolution rate (DR) values could be correlated with energy deposition profiles due to e-beam exposure and used as input in e-beam lithography (EBL) simulation tools in order to improve the accuracy of the simulation and decrease the number of actual test exposures for process optimization.
Th.Mpatzaka, G.Papageorgiou, N.Papanikolaou, E.Valamontes, Th.Ganetsos, D.Goustouridis, I.Raptis, G.Zisis Microelectron. Eng. 9 100070(2020) “In-situ characterization of the development step of high-resolution e-beam resists””

Article “Process study & lithographic performance of silsesquioxane based e-beam resist Medusa 82”

In the past 2 decades silsesquioxane has gained attention in the Electron Beam Lithography community as a negative tone electron-sensitive resist (HSQ) whose advantages (sub-20 nm resolution, high contrast, low Line Edge Roughness, good shape fidelity and high etch resistance) outnumber its associated drawbacks (limited shelf-life, chemical instability issues, process residuals, low sensitivity, cost). The new silsesquioxane based resist, developed by Allresist GmbH, Medusa 82 (official product name: SX AR-N 8200) and Medusa 82 UV (SX AR-N 8250), its highly sensitive counterpart, have been designed to address all these issues. The objective of this work is to use fundamental Contrast Curve analysis, Dissolution Monitoring and parametric e-beam lithography experiments to study the influence of processing conditions (Post Exposure Bake Temperature, Development duration and developer strength) on the lithographic performance of sub-40 nm thick films.
Th.Mpatzaka, G.Zisis, I.Raptis, V.Vamvakas, Ch.Kaiser, T.Mai, M.Schirmer, M.Gerngroß, G.Papageorgiou, Micro Nano Eng. 8 100065(2020) “Process study and the lithographic performance of commercially available silsesquioxane based electron sensitive resist Medusa 82”

Oct. 15: FR-Monitor v3.3 Release

The version 3.3 of FR-Monitor software was released on October 29th, 2015

FR-Monitor, is our user-friendly software for the control of all modules in FR-tool series and for the measurement of thickness(es) and optical properties of film stacks. FR-Monitor was considerably upgraded and reached v3.3. In this version, certain new features and improvements were added, a small number of a small fraction of which are:

  • Improved GUI fro easier operation
  • Calculation in units other than nanometers.
  • Updated colour analysis method
  • Extended Materials Database both in terms of materials and optical properties models

FR-Monitor v3.3 is available for download for both 32- and 64-bit operating systems to all our customers.

FR-Monitor run in all computers with Windows XP, 7, 8, 10

For more information please contact the technical support at: techsupport@thetametrisis.com

Sept. 15: FR-Monitor v3.2 Release

The version 3.2 of FR-Monitor software was released on September 1st, 2015

FR-Monitor, is our user-friendly software for the control of all modules in FR-tool series and for the measurement of thickness(es) and optical properties of film stacks. FR-Monitor was considerably upgraded and reached v3.2. In this version, certain new features and improvements were added, a small number of a small fraction of which are:

  • Option of linked layers per category in case of multilayers of repeating films.
  • Updated colour analysis method
  • Extended Materials Database both in terms of materials and optical properties models

FR-Monitor v3.2 is available for download for both 32- and 64-bit operating systems to all our customers.

FR-Monitor run in all computers with Windows XP, 7, 8, 10

For more information please contact the technical support at: techsupport@thetametrisis.com

June 16: Yi Xin technology: new representative in China

Yi-Xin Technology and ThetaMetrisis has signed an agreement for the distribution of ThetaMetrisis products in the market of China.

Prospective customers from China are kindly requested to contact Mr. Simon Hao for further information on ThetaMetrisis products and live demonstration of their capabilities.

Simon Hao — Sales Director Yixin Technology — Professional Supplier for Micro-Nano Science SH office:

上海市沪青平公路2008号（靠明珠路）竞衡大业广场803室 Mobile: +86 13636694894

Email: simon.hao@micro-nanotech.com

Website: www.micro-nanotech.com